专利名称：DUAL BEAM SET-UP FOR SCATTEROMETER 发明人：WADMAN, Sipke
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申请日：20060804
公开号：WO07/020554P1
公开日：
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专利内容由知识产权出版社提供
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mba报考条件摘要：A scatterometer or parousiameter having a dual beam tup and method for u thereof is provided for producing measurements of optical parameters. The dual beam parousiameter includes a hemispherical dome enclosure (318) aled at the bottom with a ba (320). A radiation source (302) produces radiation in two beams, an illumination beam (304) for illuminating a sample surface (308) and a calibration beam (330) for providing optical characterization information about the illumination beam (304). Each beam is guided into the hemispherical dome enclosure (318) via parate optical paths. An optical imaging device (324) is positioned to acquire an image of scatter radiation (314) scattered by the sample surface (308) illuminated by the illumination beam (304), and acquire an image of the calibration beam, simultaneously. The calibration beam image is ud to compensate for variability in optical output of the radiation source (302) when analyzing the scatter radiation data.
短语练习申请人：WADMAN, Sipke
地址：Groenewoudweg 1 NL-5621 BA Eindhoven NL,1251 Avenue Of The Americas New York, New York 10020 US,Groenewoudweg 1 NL-5621 BA Eindhoven NL 国籍：NL,US,NL
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代理机构：KONINKLIJKE PHILIPS ELECTRONICS, N.V.更多信息请下载全文后查看
