专利名称：Pattern formation method
发明人：Endo, Masayuki Matsushita Electric Ind. Co, Ltd,Sasago, Masaru Matsushita Electric Ind.
Co., Ltd
fiercest申请号：EP06006439.1
lift是什么意思
panel是什么意思>英语字母书写申请日：20060328
百分比英文
公开号：EP1729178B1
rl
公开日：
20070829
专利内容由知识产权出版社提供
上衣的英语单词摘要：In a pattern formation method, a resist film is formed on a substrate, an alkali-soluble first barrier film is formed on the resist film and an alkali-insoluble cond barrier film is formed on the first barrier film. Subquently, with a liquid provided on the cond barrier film, pattern exposure is performed by lectively irradiating the resist film with exposing light through the cond barrier film and the first barrier film. Then, after removing the cond barrier film, the resist film having been subjected to the pattern exposure is developed, so as to remove the first barrier film and form a resist pattern made of the resist film.
申请人：MATSUSHITA ELECTRIC IND CO LTD
地址：JP
babyboom国籍：JP
maier代理机构：Grünecker, Kinkeldey, Stockmair & Schwanhäusr Anwaltssozietät
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