Structure and method for failure analysis in a m

更新时间:2023-07-15 10:37:15 阅读: 评论:0

专利名称:Structure and method for failure analysis in
a miconductor device
fek发明人:Ki-Am Lee,Sang-Deok Kwon,Jong-Hyun Lee
英文歌曲下载申请号:US11291242
申请日:20051130
公开号:US20060118784A1
above公开日:
流行英文名字
新东方泡泡英语怎么样
申请留学加拿大
20060608
专利内容由知识产权出版社提供
影评英文专利附图:
摘要:In a method and structure for miconductor failure analysis, the structure compris: a plurality of analytic fields dispod on a predetermined area of afullscale
miconductor device; miconductor transistors arranged in each of the analytic fields,
the miconductor transistors arranged in an array; wordlines arranged on each of the plurality of the analytic fields, connecting the miconductor transistors with each other in a first direction; and bitline structures on each of the plurality of the analytic fields, connecting the miconductor transistors with each other in a cond direction, wherein the bitline structures are configured in different patterns in each of the plurality of analytic fields.
申请人:Ki-Am Lee,Sang-Deok Kwon,Jong-Hyun Lee索引是什么
地址:Yongin-si KR,Seoul KR,Sunwon-si KR
国籍:KR,KR,KR
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