Method in depositing metal oxide materials

更新时间:2023-06-27 05:30:52 阅读: 评论:0

专利名称:Method in depositing metal oxide materials
发明人:Jarmo Maula,Kari Harkonen
申请号:US12663782
申请日:20080702
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公开号:US08367561B2
公开日:
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摘要:The prent invention relates to a method for enhancing uniformity of metal oxide coatings formed by Atomic Layer Deposition (ALD) or ALD-type process. Layers are formed using alternating puls of metal halide and oxygen-containing precursors,preferably water, and purging when necessary. An introduction of modificator puls
following the puls of the oxygen-containing precursor affects positively on layer uniformity, which commonly exhibits gradients, particularly in applications with cloly arranged substrates. In particular, improvement in layer thickness uniformity is obtained. According to the invention, alcohols having one to three carbon atoms can be ud as the modificator.cuties
申请人:Jarmo Maula,Kari Harkonen
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地址:Espoo FI,Kauniainen FI
holly国籍:FI,FI
代理机构:Oliff & Berridge, PLC
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