专利名称：COMPOUND, POSITIVE RESIST
COMPOSITION AND METHOD FOR
FORMING RESIST PATTERN
发明人：SHIONO, Daiju,HIRAYAMA, Taku,HADA, Hideocellpadding
申请号：JP2007055661
申请日：20070320
公开号：WO07/148456P1
美甲学校公开日：
laoyi20071227
心算方法专利内容由知识产权出版社提供范围英文
摘要：Disclod are a compound usable for a resist composition, a positive resist composition containing such a compound, and a method for forming a resist pattern. Specifically disclod is a compound reprented by the formula (A-1) below. In the formula (A-1) below, R11-R17 respectively reprent an alkyl group or an aromatic hydrocarbon group; g and j respectively reprent an integer of not less than 1, k and q respectively reprent an integer of not less than 0, and g + j + k + q is not more than 5;
b reprents an integer of not less than 1, l and m respectively reprent an integer of not less than 0, and b + l + m is not more than 4;
专八报名时间c reprents an integer of not less than 1, n an
d o respectively reprent an integer of not less than 0, and c + n + o is not mor
pr是什么
2013考研政治真题e than 4; A reprents a trivalent aromatic cyclic group, an alkyl group, an alicyclic group, or a trivalent organic group having an aromatic cyclic group or alicyclic group; and Z reprents a group reprented by the formula (z1) below. In the formula (z1) below, Y reprents an alkylene group, a divalent aromatic hydrocarbon group, an alicyclic group, or a divalent organic group having an aromatic hydrocarbon group or alicyclic group; and
my heart is brokenR' reprents an acid-cleavable dissolution inhibiting group.
申请人：SHIONO, Daiju,HIRAYAMA, Taku,HADA, Hideo 地址：JP,JP,JP,JP
国籍：JP,JP,JP,JP
代理机构：TANAI, Sumio
ian
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