美文阅读上海网络营销培训专利名称：Electron-beam focusing apparatus and
electron-beam projection lithography
system employing the same
发明人：Chang-wook Moon,In-kyeong Yoo,Dong-
wook Kim
altek申请号：US10792849幼儿英语说课稿>recton
o1申请日：20040305
公开号：US06870173B2
公开日：
20050322
专利内容由知识产权出版社提供
专利附图：
jason williams摘要：An electron-beam focusing apparatus for controlling a path of electron beams
emitted from an electron-beam emitter in an electron-beam projection lithography (EPL) system includes top and bottom magnets for creating a magnetic field within a vacuum chamber, the top and bottom magnets dispod above and below the vacuum chamber into which a wafer is loaded, respectively; upper and lower pole pieces magnetically contacting the top and bottom magnets, respectively, the upper and lower pole pieces penetrating a top wall and a bottom wall of the vacuum chamber, respectively; and upper and lower projections having a circular shape, extending outwardly from facing surfaces of the upper and lower pole pieces, respectively.
365天申请人：Chang-wook Moon,In-kyeong Yoo,Dong-wook Kim
地址：Seoul KR,Suwon KR,Seoul KR
国籍：KR,KR,KR星海音乐学院附中
代理机构：Lee, Sterba & Mor, P.C.
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