专利名称：Dual lection bad, targeted gene
disruption method for fungi and fungus-like
organisms
发明人：Seogchan Kang,Chang Hyun Khang厦门日语培训>我搭车
长脸适合什么发型
申请号：US10777405
申请日：20040212美国高中排名
公开号：US20050181509A1
si wa公开日：
坚强的英文
20050818carrot的音标>bonneville
专利内容由知识产权出版社提供
摘要：The invention disclod herein is uful as an efficient targeted gene manipulation tool that can be applied, with minimal modifications, to targeted genes in a broad spectrum of fungi and fungus-like organisms. The invention is bad on -mediated transformation followed by a subquent positive-negative lection scheme to isolate target mutants.
申请人：Seogchan Kang,Chang Hyun Khang
长脸适合发型地址：Port Matilda PA US,State College PA US
国籍：US,US
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