Apparatus and method for metrology

更新时间:2023-06-03 21:53:06 阅读: 评论:0

专利名称:Apparatus and method for metrology
coquette发明人:Baohua Niu,Ji-Feng Ying,David Hung-I Su
申请号:US15908201
东莞英语申请日:20180228
公开号:US10883820B2
公开日:
20210105
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摘要:A method of performing metrology analysis of a thin film includes coupling a radiation into an optical element dispod adjacent to a surface of the thin film. The radiation is coupled such that the radiation is totally internally reflected at an interface between the optical element and the thin film. An evanescent radiation generated at the
chamonixinterface penetrates the thin film. The method furthers include analyzing the evanescent radiation scattered by the thin film to obtain properties of the thin film.
申请人:TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.高一英语短文改错
地址:Hsinchu TW
beatit歌词国籍:TW
代理机构:McDermott Will & Emery LLP北京德语培训班
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