专利名称：LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE RESINS AND SOLVENT反馈英语
sunny daySYSTEM MANUFACTURE
发明人：SIDENSTICK, John,NOGA, David,MULLINS, Kathryn,PHILLIPS, Mace
申请号：EP12858583.3
申请日：20121217口才培训班
英语作文题目
陪客公开号：EP2791208B1
公开日：
mandy是什么意思
日语俳句20170906
专利内容由知识产权出版社提供
曼尼托巴大学
摘要：Disclod is a low toxicity aprotic alkyl amide solvent system ud for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be ud for either the manufacture or the dissolution of polyamideimide resins.
申请人：FUJIFILM HUNT CHEMICALS U S A INC,SIDENSTICK JOHN,NOGA DAVID,MULLINS KATHRYN,PHILLIPS MACE中小学生一对一
地址：US,US,US,US,US
国籍：US,US,US,US,US
代理机构：Boult Wade Tennant
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