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专利名称：CMP endpoint detection system
发明人：Yuh-Turng Liu
申请号：US10063135
申请日：20020325
公开号：US06688945B2
公开日：
20040210
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专利内容由知识产权出版社提供
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专利附图：
enormous
摘要：An endpoint detection system in a CMP apparatus has a polishing platen, a polishing pad covering the polishing platen, a chamber located in the polishing platen,and a gas flow system arranged in a periphery of the chamber. The gas flow system has a gas inlet ud to flow dry gas into the chamber and a gas outlet ud to evacuate water吊牌设计
vapor in the chamber. Since the gas flow system can evacuate the water vapor in the chamber, the problem of contaminants such as water droplets has been solved. The endpoint detection can thus be precily controlled.date是什么意思中文
傻瓜的英文申请人：MACRONIX INTERNATIONAL CO. LTD.despi
ancients代理人：Winston Hsu
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