JESD28A_Procedure for Measuring N-Channel MOSFET Hot-Carrier-Induced Degradation Under DC Stress

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JEDEC
STANDARD
Procedure for Measuring N-Channel MOSFET Hot-Carrier-Induced Degradation Under DC Stress JESD28-A
(Revision of JESD28)
DECEMBER 2001
恋人未满英文版JEDEC SOLID STATE TECHNOLOGY ASSOCIATION
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JEDEC Standard No. 28-A
A PROCEDURE FOR MEASURING N-CHANNEL MOSFET HOT-CARRIER-
INDUCED DEGRADATION UNDER DC STRESS
CONTENTS
Page Introduction ii
法语考试马丁路德金 我有一个梦想1  Scope    1
playbadminton
benjie2  Applicable standards    1
3  Terms and definitions    2
浦东少儿英语培训4  Technical requirements    4 4.1 Equipment requirements    4 4.2 Test structure requirements    4
4.3 Measurement requirements    4
5  Hot carrier stress test procedure    5 5.1 Determining stress bias conditions
6 5.2 Selecting test devices
7 5.3 Initial characterization 7 5.4 Stress cycle 7 5.5 Interim characterization 7
sine5.6 Stress termination 7
6  Data analysis 8
7  Precautions 9 7.1 Test sample  9 7.2 Stress 9 7.3 Interim measurements 9
全国研究生网上报名7.4 Data analysis 10
美女与野兽动画片8  Required reporting 10 8.1 Test transistor identification 10 8.2 V DD, V BB 10 8.3 MOSFET channel length and width 10 8.4 V DS  at stress, V BS  at stress, V GS  at stress 10 8.5 Initial I B at stress  10 8.6 Initial I D(lin), g m(max), V T(ci), V T(ext), I D(sat) 11 8.7 t TAR for I D(lin), g m(max), V T(ci), V T(ext), I D(sat) 11 8.8 Total test time  11 8.9 Measurement temperature 11
-i-

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