专利名称：COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO
42所双一流大学
ACHIEVE SUB-THRESHOLD PATTERN套餐英文
FEATURESbaibu
it什么意思发明人：ZHU, John J.,WANG, Zhongze,DA, Yang
rationality申请号：EP14727110.0
申请日：20140411世界杯举办地
公开号：EP2987034A1
公开日：
20160224
部队个人年终总结
专利内容由知识产权出版社提供
摘要：Features are fabricated on a miconductor chip. The features are smaller than the threshold of the lithography ud to create the chip. A method includes patterning a first portion of a feature (such as a local interconnect) and a cond portion of the feature to be parated by a predetermined distance, such as a line tip to tip space or a line space. The method further includes patterning the first portion with a cut mask to form a first sub-portion (e.g., a contact) and a cond sub-portion. A dimension of the first sub-portion is less than a dimension of a cond predetermined distance, which may be a line length resolution of a lithographic process having a specified width resolution. A feature of a miconductor device includes a first portion and a cond portion having a dimension less than a lithographic resolution of the first portion.
申请人：Qualcomm Incorporated
地址：5775 Morehou Drive San Diego, CA 92121 US
lure
国籍：USsouth是什么意思
paladin代理机构：Dunlop, Hugh Christopher 更多信息请下载全文后查看
