专利名称：Mask CD correction bad on global pattern
density
发明人：Min Cao
mywife
申请号：US11155159stay hungry stay foolish
申请日：20050617
公开号：US20060286690A1
三年级英语上册公开日：
20061221
专利内容由知识产权出版社提供
专利附图：
摘要：The prent disclosure provide a method of forming a photomask layout. In one example, the method compris lecting a pattern feature on the photomask
焦痂
layout, defining a global area centered at the pattern feature on the photomask layout,
calculating a pattern density inside the global area, and correcting the pattern feature bad on the pattern density and patterning process data.
lovely什么意思申请人：Min Cao
地址：Hsin-Chu TW
藩篱是什么意思>明月何时照我还的上一句
国籍：TWvincent 歌词
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