专利名称：THIN FILM STRUCTURES AND DEVICES
cnmWITH INTEGRATED LIGHT AND HEAT
BLOCKING LAYERS FOR LASER PATTERNING 发明人：ソン， タオイン,チアン， チョン,クァク， ビョン ソン レオ,ゴードン， ジョセフ ジー．
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申请号：JP2017224223中考复习计划
除此之外>exam
stanza申请日：20171122
公开号：JP6510008B2
废黜
公开日：
20190508
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专利内容由知识产权出版社提供
摘要：PROBLEM TO BE SOLVED: To provide an improved technique for performing lar direct patterning of a thin film battery, and similar structures and devices, which does not impair the function of the remaining layers of the thin film structures and devices.SOLUTION: An apparatus for forming an electrochemical device compris: a first system for blanket depositing, on a substrate, a stack including a cathode current collector layer, a heat blocking layer, a light blocking layer, a cathode layer, an electrolyte layer, an anode layer, an anode current collector layer, and a protective coating layer; and a cond system for direct lar patterning the stack, provided that the cond system includes at least one lar. The light blocking layer is a metal layer having the property of absorbing or reflecting a part of a lar energy; and the heat blocking layer is a conductive layer having a low thermal diffusivity D low enough to reduce a heat flow passing through the heat blocking layer such that the temperature of an adjacent device layer exceeds a melting temperature Tm.SELECTED DRAWING: None 申请人：アプライド マテリアルズ インコーポレイテッド
地址：アメリカ合衆国 カリフォルニア州 ９５０５４ サンタ クララ バウアーズ アベニュー ３０５０
国籍：US
代理人：園田・小林特許業務法人
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