专利名称：Immersion topcoat materials with improved performance
cet4作文
小企业会计准则发明人：Robert David Allen,Phillip Joe Brock,Dario Gil,William Dinan Hinsberg,Carl Eric
Larson,Linda Karin Sundberg,Gregory
Michael Wallraff
申请号：US11063940
申请日：20050223
公开号：US20060188804A1
公开日：
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专利内容由知识产权出版社提供
专利附图：
讨厌的英文摘要： A topcoat material for applying on top of a photoresist material is disclod. The topcoat material compris at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/cond in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be ud in lithography process, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly uful in immersion lithography techniques using water as the imaging medium.
申请人：Robert David Allen,Phillip Joe Brock,Dario Gil,William Dinan Hinsberg,Carl Eric Larson,Linda Karin Sundberg,Gregory Michael Wallraff
mba分数线地址：San Jo CA US,Sunnyvale CA US,Pleasantville NY US,Fremont CA US,San Jo CA US,Los Gatos CA US,Morgan Hill CA US
panna
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