纳米CeO2颗粒的制备及其化学机械抛光性能研究
职业技能培训学校Abstract:
Nanoparticles of cerium oxide (CeO2) were prepared through a simple precipitation method with Ce(NO3)3•6H2O and NH4HCO3 as the starting materials followed by calcination at 400 °C. The prepared nanoparticles were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), and Fourier transform infrared spectroscopy (FTIR). The XRD results confirmed the formation of pure cubic CeO2 pha with an average crystallite size of 9.2 nm. TEM analysis revealed spherical-shaped nanoparticles with an average particle size of 12.3 nm. FTIR spectroscopy analysis confirmed the formation of Ce-O bonds in the prepared nanoparticles. The synthesized CeO2 nanoparticles were further applied as polishing abrasives in a chemical mechanical polishing (CMP) process for planarization of copper (Cu) surfaces. The results showed that the synthesized CeO2 nanoparticles exhibited excellent polishing performance with a removal rate of 270 nm/min and a surface roughness (Ra) value of 0.25 nm after 10 min of CMP.popi
Introduction:
什么是交流电>multiple是什么意思
Cerium oxide (CeO2) nanoparticles have attracted significant attention due to their unique properties such as high surface area, high catalytic activity, and excellent redox properties. The preparation of CeO2 nanoparticles with controlled size and morphology is esntial for their applications in various fields including catalysis, energy conversion, and micro-electronics. In this paper, we report the preparation of CeO2 nanoparticles via simple precipitation method and their application as polishing abrasives in a chemical mechanical polishing (CMP) process for planarization of copper (Cu) surfaces.
郑州留学中介Experimental Section:
The CeO2 nanoparticles were prepared by a simple precipitation method with Ce(NO3)3•6H2O (99.99%) and NH4HCO3 (99.99%) as the starting materials. In a typical synthesis, 0.5 M Ce(NO3)3•6H2O solution was slowly added to 1 M NH4HCO3 solution under constant stirring at room temperature. The resulting mixture was then heated at 80 °C for 2 h followed by calcination at 400 °C for 4 h. The synthesized nanoparticles were c
haracterized by XRD (Bruker D8 ADVANCE), TEM (FEI Tecnai G2 F20 S-TWIN), and FTIR (Bruker VERTEX 70) techniques. The synthesized CeO2 nanoparticles were further applied as polishing abrasives in a CMP process for planarization of Cu surfaces. The CMP process was carried out using a commercial slurry compod of CeO2 nanoparticle (10 wt%), hydrogen peroxide (5 wt%), and deionized water (85 wt%).
etuResults and Discussion:
pant的意思The XRD patterns of the synthesized CeO2 nanoparticles are shown in Figure 1. The XRD pattern showed sharp and inten peaks corresponding to the cubic pha of CeO2 with an average crystallite size of 9.2 nm calculated using the Scherrer equation. The TEM image of the synthesized CeO2 nanoparticles (Figure 2) showed a spherical shape with an average particle size of 12.3 nm. The FTIR spectra of the synthesized CeO2 nanoparticles (Figure 3) showed the characteristic peaks at 460 cm-1 and 570 cm-1, which correspond to the Ce-O stretching vibration mode.第一时间英文
雅思教父
The CMP performance of the synthesized CeO2 nanoparticles was evaluated by planarizi
ng the Cu surfaces with the CMP process. The polishing rate and surface roughness were measured as a function of polishing time. The results shown in Figure 4 indicate that the polishing rate incread rapidly with polishing time and reached a maximum of 270 nm/min after 5 min of polishing. The surface roughness, on the other hand, decread with polishing time and reached a minimum Ra value of 0.25 nm after 10 min of polishing. The high polishing rate and low surface roughness demonstrated that the synthesized CeO2 nanoparticles have excellent polishing performance.
