EUV lithography system and operating method

更新时间:2023-05-23 22:31:37 阅读: 评论:0

双汇致歉专利名称:EUV lithography system and operating
method
发明人:Dirk Heinrich Ehm,Stefan-Wolfgang
Schmidt,Edgar Osorio,Edwin Te Sligte,Mark
Zellenrath,Hella Logtenberg
了如指掌申请号:US15483607
申请日:20170410
公开号:US10073361B2
公开日:
圆的有关性质
扇贝蒸粉丝20180911
专利内容由知识产权出版社提供
聚餐讲话
专利附图:千山暮雪床戏
摘要:An EUV lithography system () includes: at least one optical element () having an
optical surface () arranged in a vacuum environment () of the EUV lithography system (), and a feed device () for feeding hydrogen into the vacuum environment (), in which at least one silicon-containing surface () is arranged. The feed device () additionally feeds an oxygen-containing gas into the vacuum environment () and has a metering device () that ts an oxygen partial pressure (p) at the at least one silicon-containing surface () and/or at the optical surface ().
申请人:Carl Zeiss SMT GmbH,ASML NETHERLANDS B.V.
凤凰古城自驾游攻略地址:Oberkochen DE,Veldhoven NL
圆白菜国籍:DE,NL
代理机构:Edell, Shapiro & Finnan, LLC
更多信息请下载全文后查看

本文发布于:2023-05-23 22:31:37,感谢您对本站的认可!

本文链接:https://www.wtabcd.cn/fanwen/fan/89/925743.html

版权声明:本站内容均来自互联网,仅供演示用,请勿用于商业和其他非法用途。如果侵犯了您的权益请与我们联系,我们将在24小时内删除。

标签:专利   全文   下载   知识产权   出版社   内容
相关文章
留言与评论(共有 0 条评论)
   
验证码:
推荐文章
排行榜
Copyright ©2019-2022 Comsenz Inc.Powered by © 专利检索| 网站地图