双汇致歉专利名称：EUV lithography system and operating
method
发明人：Dirk Heinrich Ehm,Stefan-Wolfgang
Schmidt,Edgar Osorio,Edwin Te Sligte,Mark
Zellenrath,Hella Logtenberg
了如指掌申请号：US15483607
申请日：20170410
公开号：US10073361B2
公开日：
圆的有关性质
扇贝蒸粉丝20180911
专利内容由知识产权出版社提供
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专利附图：千山暮雪床戏
摘要：An EUV lithography system () includes: at least one optical element () having an
optical surface () arranged in a vacuum environment () of the EUV lithography system (), and a feed device () for feeding hydrogen into the vacuum environment (), in which at least one silicon-containing surface () is arranged. The feed device () additionally feeds an oxygen-containing gas into the vacuum environment () and has a metering device () that ts an oxygen partial pressure (p) at the at least one silicon-containing surface () and/or at the optical surface ().
申请人：Carl Zeiss SMT GmbH,ASML NETHERLANDS B.V.
凤凰古城自驾游攻略地址：Oberkochen DE,Veldhoven NL
圆白菜国籍：DE,NL
代理机构：Edell, Shapiro & Finnan, LLC
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