专利名称：LOW TOXICITY SOLVENT SYSTEM FOR POLYAMIDEIMIDE RESINS AND SOLVENT
SYSTEM MANUFACTURE
发明人：SIDENSTICK, John,NOGA, David,MULLINS, Kathryn,PHILLIPS, Mace
泥娃娃申请号：EP12858583.3
仙客来怎么养家庭养法申请日：20121217
公开号：EP2791208B1
公开日：
男性保健20170906
专利内容由知识产权出版社提供
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摘要：Disclod is a low toxicity aprotic alkyl amide solvent system ud for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be ud for either the manufacture or the dissolution of polyamideimide resins.过年习俗
申请人：FUJIFILM HUNT CHEMICALS U S A INC,SIDENSTICK JOHN,NOGA DAVID,MULLINS KATHRYN,PHILLIPS MACE
论文目录怎么自动生成地址：US,US,US,US,US
国籍：US,US,US,US,US
小孩说话代理机构：Boult Wade Tennant
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