专利名称：Energy stabilized gas discharge lar
发明人：Uwe Stamm,Igor Bragin,Wolfgang Zschocke
申请号：US09513025
申请日：20000225
生气近义词
公开号：US06714577B1
语字成语
心理健康教育总结公开日：
20040330
在校期间参加社会工作情况专利内容由知识产权出版社提供
两岸关系专利附图：
摘要：An excimer or molecular fluorine lar, such as a KrF- or ArF-lar, or a六级评分标准
molecular fluorine (F) lar, particularly for photolithography applications, has a gas mixture including a trace amount of a gas additive. The concentration of the gas additive in the gas mixture is optimized for improving energy stability and/or the overshoot
control of the lar output beam. The concentration is further determined and adjusted at new fills and/or during lar operation bad on its effect on the output pul energy in view of constraints and/or aging on the discharge circuit and/or other components of the lar system. Attenuation control is also provided for increasing the lifetimes of components of the lar system by controlling the concentration of the gas additive over time. A specific preferred concentration of xenon is more than 100 ppm for improving the energy stability and/or overshoot control. The lar system may be equipped with an internal gas supply unit including an internal xenon gas supply, or a xenon generator for supplying xenon gas from condend matter xenon.
申请人：LAMBDA PHYSIK AG
男人使用说明书代理机构：Sierra Patent Group, Ltd.
代理人：Andrew V. Smith
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