寓言故事作文
专利名称：COMBINING CUT MASK LITHOGRAPHY AND CONVENTIONAL LITHOGRAPHY TO
ACHIEVE SUB-THRESHOLD PATTERN
店铺风水学FEATURES
发明人：ZHU, John J.,WANG, Zhongze,DA, Yang
收入分配差距
学校应急预案申请号：EP14727110.0
申请日：20140411
公开号：EP2987034A1
公开日：
20160224五年级下册课文
专利内容由知识产权出版社提供
摘要：Features are fabricated on a miconductor chip. The features are smaller than the threshold of the lithography ud to create the chip. A method includes patterning a first portion of a feature (such as a local interconnect) and a cond portion of the feature to be parated by a predetermined distance, such as a line tip to tip space or a line space. The method further includes patterning the first portion with a cut mask to form a first sub-portion (e.g., a contact) and a cond sub-portion. A dimension of the first sub-portion is less than a dimension of a cond predetermined distance, which may be a line length resolution of a lithographic process having a specified width resolution. A feature of a miconductor device includes a first portion and a cond portion having a dimension less than a lithographic resolution of the first portion.
申请人：Qualcomm Incorporated
地址：5775 Morehou Drive San Diego, CA 92121 US
广西分数线
国籍：US
代理机构：Dunlop, Hugh Christopher 更多信息请下载全文后查看惊愕的近义词是什么
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