专利名称：Exposure method, exposure apparatus, and彩色宝石
蛋挞皮做法
mask
发明人：Makoto Tsuchiya,Kei Nara,Nobutaka
双子和天秤Fujimori,Manabu Toguchi,Masami Seki
申请号：US08848394
申请日：19970508
访谈记录公开号：US06204912B1
公开日：
20010320
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专利附图：
摘要：An exposure method, exposure apparatus and mask are suitable for
manufacturing an active matrix liquid crystal display including, for example, a gate
electrode layer and a source/drain electrode layer. A stitching portion between unit patterns in a cond layer is offt from the stitching portion in a first layer by a predetermined distance. The stitching portions of the cond layer are always positioned over unit patterns of the first layer. Accordingly, the contrast gap that occurs at the stitching portion as a boundary is defined only by an error in the exposure position of the cond layer. The contrast gap is not affected by an error in the exposure position of the first layer, unlike the conventional method. Becau the contrast gap caud by the error in the exposure position of the first layer is eliminated, the total contrast gap that occurs at the stitching portion as a boundary is significantly reduced.补充养老保险
申请人：NIKON CORPORATION
协议采购代理机构：Nixon & Vanderhye P.C.
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