桌面图标变成白色专利名称：Apparatus for hybrid chemical processing
运行命令发明人：Ling Chen,Vincent W. Ku,Mei Chang,Dien-Yeh咖啡杀精吗
Wu,Hua Chung
申请号：US12172092重庆有什么特产
申请日：20080711
公开号：US07591907B2三年级上册数学口算题
公开日：
怎么选奶粉
20090922
粉笔教师专利内容由知识产权出版社提供
专利附图：
摘要：In one embodiment, an apparatus for performing an atomic layer deposition (ALD) process is
provided which includes a chamber body containing a substrate support,a lid asmbly attached to the chamber body, a remote plasma system (RPS) in fluid
communication with the reaction zone, a centralized expanding conduit extending through the lid asmbly and expanding radially outwards, a first gas delivery sub-asmbly configured to deliver a first process gas, and a cond gas delivery sub-asmbly configured to deliver a cond process gas into the centralized expanding conduit. The first gas delivery sub-asmbly contains an annular channel encircling and in fluid communication with the centralized expanding conduit, wherein the annular channel is adapted to deliver the first process gas through a plurality of passageways and nozzles and into the centralized expanding conduit. The cond gas delivery sub-asmbly contains a gas inlet in fluid communication to the centralized expanding conduit.
申请人：Ling Chen,Vincent W. Ku,Mei Chang,Dien-Yeh Wu,Hua Chung
地址：Sunnyvale CA US,San Jo CA US,Saratoga CA US,San Jo CA US,San Jo CA US 国籍：US,US,US,US,US
暗黑破坏神三
代理机构：Patterson & Sheridan, LLP
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