ETCH KERNEL DEFINITION FOR ETCH MODELING

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专利名称：ETCH KERNEL 给自己的歌 DEFINITION FOR ETCH

MODELING

发明人：Francois 终值公式 WEISBUCH,Andrey LUTICH立夏的谚语

申请号：US15475475

申请日：20170331

公开号：US2A1

公开日：20181004

专利附图：

摘要：Geometrically-defined kernels are applied along each point of a lithographic

contour to derive etch parameters that can be ud to characteriz反季节蔬菜 e the etch respon of

any structure. The etch parameters can be further ud to construct an沉迷手机的危害 accurate简单英语儿歌 etch

model. The approach provides a more detailed definition of the etch parameter space

and results in better guidance for lecting optimal calibration structures.

申请人：GLOBALFOUNDRIES INC.

地址：GRAND蓝色可爱壁纸 CAYMAN KY

国籍：KY

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