专利名称:DEPOSITING EPITAXIAL LAYER FROM GASEOUS PHASE
河南萧记烩面发明人:PAULUS ZACHARIAS ANTONIUS MARIA VAN DER PUTTE
申请号:AU4604679
申请日:19790412
公开号:AU523988B2
苹果手机配件
公开日:
19820826
古代尊称
专利内容由知识产权出版社提供光的反射现象例子
春节传说故事
摘要:Autodoping of an epitaxial layer during vapour pha deposition is reduced by removing part of an initially deposited layer 1 by gas etching before depositing the high resistivity layer 2. An initial gas etching step cleans the upper face 6 of substance 3 and simultaneously covers the lower face 7 with a miconductor layer 8 by a transport reaction utilising as source a layer of the miconductor material provided on the surface of the heating susceptor (4) on which the substrate rests. Layer 8 is incread in thickness during the cond etching step.特来
西班牙签证申请人:PHILIPS: GLOEILAMPENFABRIEKEN, N.V.
更多信息请下载全文后查看
宿州电大