专利名称：METHOD FOR PATTERNING A LACQUER
我承认都是月亮惹的祸LAYER TO HOLD ELECTRICAL GRIDLINES
护理专业
发明人：Jan Matthijs ter Meulen,Patrick Peeters
申请号：US13430923
申请日：20120327
公开号：US20120252211A1
公开日：
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专利内容由知识产权出版社提供
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摘要：A method is provided for simultaneously forming functional light structures and grooves configured to hold electrical circuitry on a lacquer layer deposited on a ba substrate, which is for u in an optoelectronic device. The method includes applying the lacquer layer on the ba substrate and heating it beyond its glass transition
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temperature to soften it. Thereafter, a stamper is ud to simultaneously replicate the grooves and the functional light structures onto the lacquer layer. The stamper has a mating surface, which has negative impressions of the grooves on its first portion and the functional light structures on its cond portion. Thereafter, the lacquer layer is cooled and the electrical circuitry is formed in the grooves on the lacquer layer.
申请人：Jan Matthijs ter Meulen,Patrick Peeters
育肥羊地址：New Delhi IN,New Dehli IN 国籍：IN,IN
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