Stacked via Kelvin resistance test structure for m

更新时间:2023-07-29 00:14:15 阅读: 评论:0

专利名称:Stacked via Kelvin resistance test structure
for measuring contact anomalies in multi-
level metal integrated circuit technologies
发明人:Robert Alan Ashton,Steven Alan Lytle,Mary
资阳景点Drummond Roby,Daniel Joph Vitkavage
申请号:US09388203
吴吟秋申请日:19990901古代法律
公开号:US06362638B1
公开日:
20020326
专利内容由知识产权出版社提供
专利附图:
摘要:A method and apparatus for measuring Kelvin contact resistance within an
小青蛙找家教案>深圳居住证查询
integrated circuit interconnect is provided, having upper and lower Kelvin contact resistance contacts covering a via and interconnect being measured, along with a third conductor placed substantially between the upper and lower Kelvin contacts, and in contact with the via.数学趣事
青椒炒肉丝怎么做申请人:AGERE SYSTEMS GUARDIAN CORP.
爱的接力代理机构:Alston & Bird LLP
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