专利名称：Wafer bevel polymer removal
手机清理缓存发明人：Jeremy Chang,Andreas Fischer,Peter中国旗袍
Loewenhardt
申请号：US10934081
申请日：20040903
公开号：US07597816B2
公开日：
岛上书店20091006
学习日志
专利内容由知识产权出版社提供
名胜古迹英语
专利附图：
体检前的注意事项
摘要：A method of forming a miconductor device is provided. A wafer with a dielectric layer dispod under a photoresist mask is placed in an etch chamber. The dielectric layer is etched. The wafer is raid. A cleaning gas is provided. A plasma is
formed from the cleaning gas. A polymer that has formed on the bevel of the wafer is removed using the plasma from the cleaning gas. The wafer is removed from the etch chamber.
申请人：Jeremy Chang,Andreas Fischer,Peter Loewenhardt
地址：Sunnyvale CA US,Castro Valley CA US,Pleasanton CA US
崔成林
国籍：US,US,US
电梯维保合同
代理机构：Beyer Law Group LLP
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