专利名称：Method and apparatus for regenerating resist stripping solution
发明人：井上 恭，井城 大世，小林 繁，増田 義登
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申请号：JP2012226430梦到大雪
申请日：20121011
公开号：JP6156678B2
公开日：
十六字
20170705
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现代园艺摘要：PROBLEM TO BE SOLVED: To solve such a problem that in regeneration of a resist stripping solution in the prior arts, a water content is parated from a ud resist stripping solution and a solvent component is parated and extracted, however, the water content actually parated by vaporization cannot be regarded to be completely safe to the nature.SOLUTION: A regeneration apparatus for a resist stripping solution includes: a low boiling point parator for extracting a part of water as a waste solution (A) from a ud resist stripping solution containing at least a solvent, water and a resist component by vaporization paration; a high boiling point parator for subjecting the parated residual solution from the low boiling point parator to vaporization paration to extract a parated resist residual solution containing the resist component and an additive, as well as to extract the solvent and residual water as a parated solution; a purifier for vaporizing and parating the residual water as a waste solution (B) from the parated solution from the high boiling point parator, and extracting the parated residual solution as a regenerated resist stripping solution; and a concentrator for further concentrating the waste solution (A) and the waste solution (B) to parate into water and a residual solution.
申请人：パナソニックＩＰマネジメント株式会社地址：大阪府大阪市中央区城見２丁目１番６１号
国籍：JP
经典二战电影代理人：廣幸 正樹
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