专利名称：Exposure method and apparatus and device manufacturing method
发明人：Kudo, Takehito Nikon Corp., Int. Property Dept.,Hirukawa, Shigeru Nikon Corp., Int.
Property Dept.
申请号：EP07017146.7火影忍者q版
申请日：20040330
公开号：EP1857880B1
公开日：
现代装修风格
英国布莱顿
怎么分辨玉的真假20150916
专利内容由知识产权出版社提供
讲道摘要：An exposure method and apparatus for simultaneously transferring patterns with various pitches with high resolution. On the pupil surface of an illumination system, nine areas are t. The nine areas are a first area (28) including the optical axis (BX), four cond areas (29A to 29D) each smaller than the first area and arranged along a first circumference (32A) surrounding the first area (28), and four third areas (30A to 30D) each smaller than the first area and arranged along a cond circumference (32B) surrounding the first circumference (32A) and arranged along a cond circumference. The distribution of intensity of light over the pupil surface is so t that the intensities of light over the nine areas are approximately equal to one another, and the intensity of light over the other area is smaller than tho over the nine areas. This distribution of intensity of light is t using a diffraction optical element or a diaphragm.
申请人：NIKON CORP
地址：JP
清炒香菇>爱奇艺下载的视频怎么转换成mp4国籍：JP
奥利奥慕斯蛋糕代理机构：Hoffmann Eitle 更多信息请下载全文后查看
