NWELL
Nwell to N+ spacing >= 1.00um
Nwell overlap N-tap >= 0.24um
Nwell to P-tap spacing >= 0.24um
Non-Equal Potential 3.3V Nwell spacing >= 2.00um
Equal Potential Nwell spacing >= 0.90um
Poly
3.3V N+ Poly Gate width >= 0.34um
生姜红糖水的功效与作用Gate Poly spacing over diffusion w/contact >= 0.34um
Field Poly spacing >= 0.24um
Poly extension onto field region (end cap) >= 0.22um
Field Poly spacing to diffusion >= 0.10um
End Cap Poly spacing to diffusion >= 0.12um
N+
N+ Implant width >= 0.40um
N+ Implant spacing >= 0.40um
N+ Implant Overlap N+ Diffusion (inside P-Sub) >= 0.22um
N+ Implant Overlap N+ Diffusion (inside N-Well) >= 0.08um
N+ Implant to P+ Diffusion (inside N-Well) spacing >= 0.22um
N+ Implant to P+ Diffusion (inside P-Sub) spacing >= 0.08um
N+ Implant overlap contact / Minimum P+ Implant to N+ contact spacing >= 0.12um
P+
文本格式转换P+ Implant width >= 0.40um
P+ Implant spacing >= 0.40um
P+ Implant Overlap P+ Diffusion (inside N-Well) >= 0.22um
P+ Implant Overlap P+ Diffusion (inside P-Sub) >= 0.08um
P+ Implant overlap contact / Minimum N+ Implant to P+ contact spacing >= 0.12um
Contact
Minimum and maximum contact size = 0.24umx0.24um
Contact spacing >= 0.26um感叹句的结构
Diffusion Contact to Poly spacing >= 0.30um (3.3V)
Poly Contact to Diffusion edge spacing >= 0.18um
Poly overlap Contact >= 0.10um
P+ Diffusion overlap Contact >= 0.10um
N+ Diffusion overlap Contact >= 0.10um
孙子兵法介绍
Metal1
Metal1 width >= 0.24um
Metal1 to Metal1 spacing (absolute minimum) >= 0.24um
Metal1 must enclo the contact on two entire non-adjacent edges >= 0.08um
Via1中秋的由来
Maximum and minimum MVia1 size = 0.28umx0.28um
MVia1 to MVia1 spacing >= 0.28um
Metal1 must enclo the Via1 on two entire non-adjacent edges >= 0.08um
Metal2
男生割双眼皮
Metal2 width >= 0.28um
Metal2 to Metal2 spacing (absolute minimum) >= 0.28um
学习平板电脑
Metal2 must enclo the Via1 on two entire non-adjacent edges >= 0.08um
Via2
Maximum and minimum MVia2 size = 0.28umx0.28um
MVia2 to MVia2 spacing >= 0.28um
Metal2 must enclo the Via2 on two entire non-adjacent edges >= 0.08um
