Method for inspecting photomask with pellicle and

更新时间:2023-06-23 13:54:17 阅读: 评论:0

屏幕坏点
专利名称:Method for inspecting photomask with
pellicle and pellicle adhesive durability test
apparatus
高中物理摩擦力发明人:西澤 正一郎,井田 勇人,河内 幸司
申请号:JP2013095364
申请日:20130430
星湖小学公开号:JP6303286B2
公开日:兔头卡通图片
20180404
专利内容由知识产权出版社提供
Fn键是什么意思摘要:PROBLEM TO BE SOLVED: To produce a pellicle-provided photomask by low-pressure adhesion while preventing detachment of the pellicle from the photomask.SOLUTION: A method of producing a pellicle-provided photomask compris producing a pellicle-provided photomask by adhering a pellicle frame to a photomask through crimping under an adhesion load of a low-pressing force from 1-time of the weight of the pellicle frame to 10 kg, applying a load for peeling the pellicle frame from the photomask by a downward force, with the pellicle-side surface of the pellicle-provided photomask directed downward, obrving the peeling state of the pellicle frame peeled from the photomask and evaluating the adhesion durability on the basis of the relation of the load and the peeling initiation time.
生日卡片怎么写申请人:凸版印刷株式会社蒸滑鸡
地址:東京都台東区台東1丁目5番1号
体验生活国籍:JP
更多信息请下载全文后查看

本文发布于:2023-06-23 13:54:17,感谢您对本站的认可!

本文链接:https://www.wtabcd.cn/fanwen/fan/89/1051347.html

版权声明:本站内容均来自互联网,仅供演示用,请勿用于商业和其他非法用途。如果侵犯了您的权益请与我们联系,我们将在24小时内删除。

相关文章
留言与评论(共有 0 条评论)
   
验证码:
推荐文章
排行榜
Copyright ©2019-2022 Comsenz Inc.Powered by © 专利检索| 网站地图