专利名称：NI-BASE ALLOY CONBINING MINIMIZED INTERNAL DEFECTS WITH DUCTILITY AT
HIGH TEMPERATURE AND ITS
PRODUCTION
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假如生活欺骗了你普希金发明人：MORI SHIGENOBU,TAKI MOTOJI,KURODA TETSUO
申请号：JP18515185
申请日：19850823
diamond怎么读公开号：JPH0361746B2
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xXXx直播
19910920
专利内容由知识产权出版社提供
摘要：PURPOSE:To obtain an Ni-ba alloy having minimized internal defects and excellent in ductility at high temp. by providing a composition in which specific amounts of C, Si, Mn, Ti, Al, CU, and Mg and/or Zr are blended with Ni and also providing a unidirectionally grown crystalline structure. CONSTITUTION:The Ni-ba alloy has a composition consisting of, by weight, 0.05-0.25% C, 0.01-0.5% Si, 0.01-1.5% Mn, 0.1-0.8% Ti, 3-5% Al, 7-20% Cu, 0.001-0.1% Mg and/or 0.001-0.2% Zr and the balance Ni with inevitable impurities. The above alloy has a unidirectionally grown crystalline structure, particularly, a fine crystalline structure grown unidirectionally in the direction nearly perpendicular to the central axis and preferably having <=5mm maximum grain size.暴风将至
篮球意识申请人：HITACHI LTD
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