Double anodizing process

更新时间:2023-06-18 03:33:14 阅读: 评论:0

专利名称:Double anodizing process
发明人:Lucy Elizabeth Browning,Charles B.excel取整函数
山西省高考招生网Woodhull,Bryan Patrick Kiple,David A.
Pakula,Tang Yew Tan,Julie Hanchak-
Connors,John Murray Thornton, III,Thomas
Johannesn,Peter Rusll-Clarke,Masashige宝塔寺
Tatebe,Napthaneal Y. Tan
蚌方出曝申请号:US13610813
申请日:20120911
公开号:US09420713B2面对面快传
基督教舞蹈网公开日:
20160816
专利内容由知识产权出版社提供专利附图:
摘要:Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent cond anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.
交通安全的作文申请人:Lucy Elizabeth Browning,Charles B. Woodhull,Bryan Patrick Kiple,David A. Pakula,Tang Yew Tan,Julie Hanchak-Connors,John Murray Thornton, III,Thomas Johannesn,Peter Rusll-Clarke,Masashige Tatebe,Napthaneal Y. Tan 地址:San Francisco CA US,San Francisco CA US,Los Gatos CA US,San Francisco CA US,San Francisco CA US,San Francisco CA US,Los Gatos CA US,Fjerdingby NO,San Francisco
CA US,Kakogawa JP,San Jo CA US
国籍:US,US,US,US,US,US,US,NO,US,JP,US 代理机构:Downey Brand LLP苹果手机重新启动
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