专利名称：SEMICONDUCTOR WAFER INSPECTION
METHOD
发明人：Kantarou TORII,Kouichi IMURA
申请号：US12555170
申请日：20090908冬子的故事
公开号：US20100060891A1立功立德立言>大学参军
公开日：
蜜汁叉烧肉
小年夜是几号20100311
专利内容由知识产权出版社提供
专利附图：
摘要：A miconductor wafer inspection method includes: an imaging step in which a first image being an image of the chamfered surface en from the main surface side and a cond image being an image of the chamfered surface en from the back surface side
are taken; a calculation step in which a first width is obtained bad on the first image, the first width being a width of the chamfered surface en from the main surface side, a cond width is obtained bad on the cond image, the cond width being a width of the chamfered surface en from the back surface side, and a ratio of the first width to the cond width thus obtained is calculated; and a shape determination step in which a form of the chamfered surface is determined to be abnormal in a ca where the ratio is out of a predetermined range.
神经受损怎样恢复
申请人：Kantarou TORII,Kouichi IMURArank函数排名怎么用
地址：Nagasaki JP,Nagasaki JP
国籍：JP,JP
清洁阿姨
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