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专利名称：ELECTRODIALYSIS SPACER AND STACK
发明人：Vinay Sonu SAWANT,John H.
BARBER,Harikrishnan RAMANAN,Varshneya
SRIDHARAN
感谢家人的话申请号：US15106282
申请日：20140820
公开号：US20160310902A1成长的路口
公开日：
知了的夏天
20161027
专利内容由知识产权出版社提供国防教育黑板报
初中物理怎么学>abstract
专利附图：
摘要：A spacer for a membrane stack has an upper surface and a lower surface. The upper surface
has a raid perimeter surrounding a membrane supporting ction. The
spacer has one or more protrusions and recess configured such that the one or more protrusions of a first spacer fit into one or more recess of a cond spacer with the same protrusions and recess stacked against the first spacer. Optionally, there may be an interference or snap fit. In a stack, membranes are placed on the membrane supporting ctions located between spacers. In one embodiment, the bottom of an upper spacer rests on the raid perimeter of a lower spacer. A spacer may have a hole extending from an edge of the spacer to the interior of a flow field within the spacer. The hole allows access to the flow field for diagnostic testing and/or sampling.
时运变迁申请人：General Electric Company
地址：Schenectady NY US
国籍：US
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