专利名称：Plasma chamber using the same, and plasma
source coil
如皋发明人：キム，ナム フン,リー，ド ヒウング,オー，ヨウン
グ クン
申请号：JP2007506080
除夕时间申请日：20050329
公开号：JP2007531235A
公开日：
显陵20071101
专利内容由知识产权出版社提供
专利附图：
摘要： It is possible to provide a plasma source coil shown [issue] a uniform ΔCD distribution, the plasma chamber using the same. The bushing 330 is dispod in the
粟智
center, around the bushing 330 A1 A plasma source coil 320 includes a coil unit 321 to 324
of a plurality are arranged concentrically around the bushing 330. One side of the bushing and each unit The coils are connected in common to the power supply terminal 316, the other side of the bushing and the unit coils, which are arranged to be connected to a common ground terminal. [Selection] Figure Figure 1
申请人：アダプティーブ プラズマ テクノロジー コーポレイション
英雄联盟隐藏分短暂地址：大韓民国、４６７－８１３ ギイオンギ－ド、イチェオン－シ、マジャング－ミエオン、イチイ－リ ３５２－１
国籍：KR
小河怎么画
代理人：篠原 泰司，藤中 雅之
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