CHEMICAL-MECHANICAL-POLISHING SYSTEM WITH CONTINU

更新时间:2023-06-02 09:38:44 阅读: 评论:0

专利名称:CHEMICAL-MECHANICAL-POLISHING
SYSTEM WITH CONTINUOUS FILTRATION 发明人:RUSS, Richard, D.,THOMAS, Daniel
申请号:US1999026502
怎么改善法令纹申请日:19991110
公开号:WO00/027591P1
瘦肩膀>形容思念的成语公开日:
福山小学
20000518
专利内容由知识产权出版社提供
椰青怎么打开摘要:A chemical-mechanical-polishing system [10] having a slurry distribution system [12], a polisher [16], a deionized water supply [18], and a drain [20], includes a slurry filtration system [14]. The filtration system [14] has two filters [26, 28] for alternately filtering particles in slurry and being backflushed with deionized water. Two input valves [22, 24] have input ports connected to the slurry distribution system [14] and output ports respectively connected to the filters [26, 28] for filtering. Two output valves [30, 32] have input ports respectively connected to the filters [26, 28] for receiving filtered slurry and output ports connected to the polisher. Two backflush valves [40, 42] have input ports connected to the deionized water supply [18] and output ports respectively connected to backflush with deionized water; the output ports are also respectively connected to the input ports of the two output valves [30, 32]. Two drain valves [44, 46] have input ports respectively connected to the filters [26, 28] for receiving backflushed fluid and output ports connected to the drain [20]. A pressure nsor [34] dispod to n pressure of slurry across the filters [26, 28] provide pressure indications which are ud by control circuitry [48] to open and clo said valves [22, 24, 30, 32, 40, 42, 44, 46] to filter slurry or backflush the filters [26, 28].
nba第一高人申请人:KONINKLIJKE PHILIPS ELECTRONICS N.V.地址:NL
国籍:NL
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