Apparatus and method for metrology

更新时间:2023-05-25 16:21:23 阅读: 评论:0

专利名称:Apparatus and method for metrology
发明人:Baohua Niu,Ji-Feng Ying,David Hung-I Su
申请号:US15908201
吃什么补胶原蛋白申请日:20180228
湄公河巨型鲶鱼公开号:US10883820B2
两副春联公开日:
小学信息20210105
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摘要:A method of performing metrology analysis of a thin film includes coupling a radiation into an optical element dispod adjacent to a surface of the thin film. The radiation is coupled such that the radiation is totally internally reflected at an interface between the optical element and the thin film. An evanescent radiation generated at the
interface penetrates the thin film. The method furthers include analyzing the evanescent radiation scattered by the thin film to obtain properties of the thin film.
申请人:TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
地址:Hsinchu TW
国籍:TW煮猪大肠
代理机构:McDermott Will & Emery LLP
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