LASER MASK

更新时间:2023-05-24 12:00:21 阅读: 评论:0

简历怎么写模板专利名称:LASER MASK
手机5g手机
利润总额公式发明人:UCHIDA MASANOBU,HASHIMOTO NOBUHIRO,KURATA KAZUMASA 申请号:JP19547090
申请日:19900724
公开号:JPH0481752A参与分配申请书
除书公开日:
欧阳修散文19920316
专利内容由知识产权出版社提供
摘要:PURPOSE:To allow the execution of distortionfree marking by incorporating patterned reflecting film of a three-layered constitution formed by laminating a chromium film, copper alloy film and copper film on a quartz glass substrate and providing similarly patterned silicon dioxide films thereon. CONSTITUTION:The reflecting film 2 of the three-layered constitution laminated with the chromium film 2a, the copper alloy film 2b and the copper film 2c in this order is provided on the quartz glass substrate 1. Further, the silicon dioxide film 3 is provided thereon. The quartz glass substrate which is a material optically transparent to a lar beam and has usually about 0.2 to 6mm thickness is ud as the quartz glass substrate 1. The reflecting film 2 consists of the three-layered constitution laminated with the chromium film 2a, the copper alloy film 2b and the copper film 2c, for which a specified optical density (generally bout 2.6 to 3.0) is necessary in order to have a light shielding property as a mask. The marking by the lar is ud by using such lar mask, by which bridges are no longer needed for image parts (character parts) as the conventional metallic plate and the distorted characters are no longer formed.
提供培训>土鸡养殖
申请人:TOPPAN PRINTING CO LTD
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