专利名称：High numerical aperture ring field projection
大学生职业生涯规划书结束语
system for extreme ultraviolet lithography
发明人：Rusll Hudyma
申请号：US09697071
申请日：20001026辣的英文
公开号：US06318869B1
甲亢病是什么症状公开日：
我是一名护士
20011120
专利内容由知识产权出版社提供
专利附图：
摘要：An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave
mirror, a cond mirror, a third convex mirror, a fourth腰酸的原因
事故安全心得体会
concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12°, and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15°. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 &mgr;m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 &mgr;m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 &mgr;m.
动名词做宾语申请人：HUDYMA RUSSELL
思科
代理机构：Sierra Patent Group, Ltd.
代理人：Andrew V. Smith
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