专利名称：DIFFERENTIAL PHASE-CONTRAST IMAGING 发明人：RÖSSL, Ewald
申请号：EP11778705.1
申请日：20111012军旅情怀
我爱妹妹公开号：EP2630477A1
酷似造句
公开日：雅典是哪个国家
20130828
专利内容由知识产权出版社提供
摘要：The prent invention relates to differential pha-contrast imaging, in particular to a structure of a diffraction grating, e.g. an analyzer grating and a pha grating, for X-ray differential pha-contrast imaging. In order to make better u of the X-ray radiation passing the object, a diffraction grating (14) for X-ray differential pha-contrast imaging is provided with at least one portion (24) of a first sub-area (26) and at least one portion (28) of a cond sub-area (30). The first sub-area compris a grating structure (54) with a plurality of bars (34) and gaps (36) being arranged periodically with a first grating pitch P G (38), wherein the bars are arranged such that thy change the pha and/or amplitude of an X-ray radiation and wherein the gaps are X-ray transparent. The cond sub-area is X-ray transparent and wherein the at least one portion of the cond sub-area provides an X-ray 1 transparent aperture (40) in the grating. Portions of the first and cond sub-areas are arranged in an alternating manner in at least one direction (42).
申请人：Koninklijke Philips Electronics N.V.,Philips Intellectual Property & Standards GmbH中国象棋大赛
地址：High Tech Campus 5 5656 AE Eindhoven NL,Lübeckertordamm 5 20099 Hamburg DE
国籍：NL,DE
创业人物代理机构：Steffen, Thomas 更多信息请下载全文后查看陶罐与铁罐
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