积阴德
有关于冬天的诗句专利名称：Intermediate layer material composition for multilayer resist process and pattern
formation process using the same
发明人：Kazuya Uenishi,Kenichiro Sato有你同在
申请号：US10652320
油焖茄子申请日：20030902
公开号：US20040053162A1
慢性肝炎症状公开日：
20040318
专利内容由知识产权出版社提供工作简报
化妆课摘要：The intermediate layer material composition for a multilayer resist process in the prent invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern paration and a line edge roughness in patterning an upper resist, and a pattern formation process using the intermediate layer material composition, in which the intermediate layer material composition for a multilayer resist process, compris a polymer (component A) containing a repeating unit having on a side chain thereof a specific structure containing a silicon atom-oxygen atom bond, and the pattern formation process using the same.
祛湿吃什么食物申请人：FUJI PHOTO FILM CO., LTD.
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