LEVEL SHIFT

更新时间:2023-05-08 10:43:14 阅读: 评论:0

Level Shifters for High-Speed1-V to3.3-V Interfaces
in a 0.13-µm Cu-Interconnection/Low-k CMOS Technology Wen-Tai Wang, Ming-Dou Ker, Mi-Chang Chiang*, and Chung-Hui Chen*
Integrated Circuits & Systems Laboratory National Chiao-Tung University
Hsinchu, Taiwan
*Design Service Devision
Taiwan Semiconductor Manufacturing Company, Ltd.
Hsinchu, Taiwan
A BSTRACT
Level shifters for 1.0-V to 3.3-V high-speed interfaces are propod. Level-up shifter us zero-Vt 3.3-V NMOSs as voltage clamps to protect 1.0-V NMOS switches from high voltage stress across the gate oxide. Level-down shifter us 3.3-V NMOSs as both pull-up and pull-down devices with supply voltag
e of 1.0-V and gate voltage swing from 0-V to 3.3-V. The zero-Vt NMOS is a standard MOSFET device in a 0.13-µm CMOS process without adding extra mask or process step to realize it. Level-up transition from 0.9-V to 3.6-V takes only 1 ns in time, and the level-down transition has no minimum core voltage limitation. The circuits do not consume static DC power, therefore they are very suitable for low-power and high-speed interfaces in the deep sub-quarter-micron CMOS technologies.
I NTRODUCTION
As demand on integrating more functions onto a chip increas, very deep sub-quarter-micron process becomes more attractive. While process shrinks, the voltage of the core logic must shrink to avoid hot carriers and gate-oxide breakdown. At the same time, 3.3-V output level is still the main stream of I/O interfaces. Level shifters are the bridges that transform signals from low core voltage (VDD) to high I/O voltage (VDDQ), and vice versa (e Fig. 1). However, conventional level shifters (Fig. 2) do not work any more as the core voltage decreas to 1-V. This is due to VDD scales too rapidly, while the threshold voltages (Vt) of 3.3-V MOSFETs stay at the same value that 3.3-V NMOSs in level-up shifter and 3.3-V PMOSs in level-down shifter cannot turn on.
There are two approaches to reduce the gap between VDD and Vt of 3.3-V NMOSs for level-up shifters. First is to u core NMOSs instead of 3.3-V NMOSs to get a lower threshold voltage. Second is to pump up VDD to 2VDD, to get a higher voltage to turn on 3.3-V NMOSs.
An I/O using 2-V MOSFETs to drive 3.3-V output level has been reported [1]. Pull-up part of post-driver and the related level shifter are simplified as shown in Fig. 3. A cascode configuration of PMOMs is ud for post-driver to avoid high voltage stress. VBIAS limits the gate voltage of PT between 1.6-V and 3.3-V to protect PT2. Though this circuit doesn’t have the drawback in conventional level-up shifter becau Vt of 2-V NMOSs is much lower than Vt of 3.3-V NMOSs, it takes tens of µAmps DC current to generate VBIAS, and need extra circuits, such as previously reported design [2], to turn-off DC bias voltage in the sleep mode.
Recently, a pump-hopping level-up shifter has been introduced [3]. It includes a signal voltage doubler to pump up a differential pair to 2VDD, and a conventional level-up shifter to transform the differential signals to a single-ended output (Figure 4). This approach doubles the effective VDD and thus reduces the gap between VDD and Vt of 3.3-V NMOSs in the conventional level-up shifters. However, it takes 5-ns in the worst PVT condition that can be too slow for hundreds MHz applications. On the other hand, if input doesn’t toggle for a long time, pumped charges will leak becau of the junction reverd-bias leakage. That will cau the effective VDD back to VDD, not 2VDD at the beginning,and make this circuit susceptible to nois [4].
We have developed a level-up shifter using zero-Vt 3.3-V NMOSs to protect 1.0-V NMOS switches from high voltage stress [Fig. 5(a)]. Another version to provide further protection to 1.0-V NMOS switches is shown in Fig. 6. 3.3-V zero-Vt NMOS is the key element which is a standard MOSFET in a 0.13-µm dual-gate oxide CMOS process [5].Therefore, no extra process is needed. Level-down shifter us 3.3-V NMOSs as both pull-up and pull-down devices with supply voltage of 1.0-V and gate voltage swing from 0-V to 3.3-V [Fig. 5(b)]. Level-up shifter achieves a short propagation delay of 1-ns, which is five times faster than the previous reported [3]. Level-down shifter without minimum VDD limitation is also described.
At the end of this work, we describe the guidelines to enable stable operations of the core logic where I/O nois approach the core voltage, VDD. It is important to note that,when I/Os operate above 100MHz with 3.3-V swings,simultaneously switching nois (SSN), as high as 0.8-V, will riously disturb the logic operations in core with supply voltage of only 1.0-V if no proper protections are implemented.
N EW L EVEL -UP S HIFTER
Figure 5 (a) is the level-up shifter. Zero-Vt 3.3-V NMOSs NA1 and NA2 are ud to protect 1.0-V NMOSs N1 and N2from high voltage stress. The gate of NA1 (NA2) is not fixed to VDD becau INT1 (INT2) will approach VDD+£G V where the gate voltage of NA1 (NA2) is at VDD and N1 (N2)is off that caus gate-oxide breakdown of N1 (N2). £G V is the balanced voltage when the subthreshold leakage of NA1(NA2) is equal to the junction reverd-bias leakages of NA1plus N1 (NA2 plus N2). Turning off NA1 (NA2) when P1 (P2)pulls up can isolate the parasitic capacitance C1 (C2) from the node LSDR1 (LSDR) and thus increa speed.
It is difficult to estimate the voltages at INT1 and INT2bad on Spice model becau the subthreshold leakage model of NA1 and NA2 is usually not accurate for the logic process.Therefore, N3 and N4 can be added to provide further protection to N1 and N2 as shown in Fig. 6.
Transfer characteristics of propod and conventional level-up shifters are simulated bad on Figure 7 and the results are illustrated in Figure 8. One input pin of each level-up shifter is fixed to VDD and another input pin, IN, is swept from 0-V to VDD. If the level-up shifter can toggle, V(OUT)needs, at least, a voltage drop of Vt below VDDQ to turn on PMOSs at the opposite side. The hardest toggling condition is found at SF process, 0o C, VDDQ = 3.6-V, and VDD = 0.9-V.All MOSFET sizes are listed in Table 1. As shown in Figure 8,even with pull-down NMOSs to pull-up PMOSs ratio as high as 60:1, conventional level-up shifter cannot toggle becau V(OUT) only drops to (VDDQ - 0.4-V) as V(IN) = VDD.
Conventional
Propod
V(IN)
V(OUT)
T ABLE 1. MOSFET S IZES IN F IGURE 7.
P3P4N5N6
1/0.31/0.360/0.3560/0.35
P1P2NA1NA2N1N2N3
N4
1/0.31/0.320/1.220/1.215/0.1315/0.1315/0.1315/0.13
Unit: µm
Fig. 9 shows the simulated waveforms in typical PVT condition (Typical process, 25o C, VDDQ = 3.3-V, and VDD = 1.0-V) using the level-up shifter circuitry shown in Figure 6.Simulations for other PVT conditions show that the maximum propagation delay from IN to OUT is 1-ns at FS process,125o C, VDDQ = 3.0-V, and VDD = 0.9-V.
Optimized sizes of NA1 and NA2 for both speed and noi margin are 10-µm /1.2-µm, half of the current sizes. The reason to cho NA1 and NA2 twice of the optimized size is to rerve guard band before real silicon out. Figure 10 shows if NA1 and NA2 are taken as 10-µm /1.2-µm or 15-µm /1.2-µm, other than 20-µm /1.2-µm, the propagation delays will reduce to 0.75-ns and 0.9-ns, respectively, which is 25% and 10% faster.
Becau NMOS switches are compod of core devices,the Vt of core devices will shrink proportionally to supply voltage, VDD. Therefore, by adjusting P1 and P2, this level-IN
OUT LSDR
N EW L EVEL -D OWN S HIFTER
Figure 5 (b) is the level-down shifter. IN1 and IN2 are 3.3-V signals, and VDD is at 1-V that makes pull-up and pull-down devices, NUP and NDN, to have large gate-to-source voltages and thus low resistance. Becau NUP and NDN always work in linear region, this circuit can work without any minimum limitation of the core voltage.
F IGURE 8. T RANSFER C HARACTERISTICS OF P ROPOSED
F IGURE 9. S IMULATED W AVEFORMS OF THE
NUP and NDN are optimized with sizes 3-µm /0.35-µm and 3-µm /0.35-µm, respectively. Conventional level-down shifter in Figure 2 has pull-up PMOS size of 30-µm /0.3-µm and pull-down NMOS size of 3-µm /0.35-µm. The worst PVT condition for the conventional one is at SS process, 0o C, and VDD = 0.9-V; VDDQ is not a key factor here. This is becau (|Vgs| - |Vt|) of pull-up 3.3-V PM
OS dominates the propagation delays. |Vt| increas at low temperature and |Vgs|decreas as VDD goes down to 0.9-V. Simulated waveforms of the worst PVT condition are shown in Figure 11. The conventional one has a propagation delay of 2.5-ns.Meanwhile, the propod one has a propagation delay of 0.5-ns, which is five times faster.
IN
New Out
Conventional
Out N OISE C ONSIDERATIONS
As I/O frequency above 100MHz and output swing as high as 3.3-V, simultaneously switching nois (SSN) induced by current spike can be as high as 0.8-V which is almost the same amplitude as VDD of 1-V. Therefore, we have the following
guidelines to help stable operations of the pre-driver and the core logic:
a)  All NMOSs in Figure 5 (a) u the same ground, VSS,
and layout cloly;
b)  All NMOSs in Figure 5 (b) u the same ground, VSS,
and layout cloly;
c)  U double guard rings to isolate I/O nois from the
pre-driver and the core (Fig 12).
d)  Put decoupling capacitors between VDD and VSS;
Decoupling capacitors can be either PMOSs or NMOSs or other active or passive devices.
e)  Put as many pick-ups as possible in the core.
Decoupling capacitors are normally ud to share the nois at VDD and VSS to a half. Here they are ud to make VDD and VSS to follow each other that keeps the voltage difference between VDD
and VSS to a constant. Numerous pick-ups are ud to help the substrate to follow the VSS C ONCLUSION
Level shifters for 1.0-V to 3.3-V interfaces are developed in a 0.13-µm CMOS process. Level-up shifter us zero-Vt 3.3-V NMOSs to protect 1.0-V NMOS switches and level-down shifter us 3.3-V NMOSs as both pull-up and pull-down devices. No extra process step, no DC power and high-speed make the level shifters suitable for low power and high-speed applications. The techniques work even at VDD below 1.0-V in the future.
A CKNOWLEDGEMENTS
We would like to thank CS Chen for uful discussions,and Cindy Lu for layout assistance.
R EFERENCES
[1] L. T. Clark, “A high-voltage output buffer fabricated on a 2V
CMOS technology,” in Proc. of Symp. on VLSI Circuits , June 1999, pp. 61-62.
[2] H. Sanchez, et al., “A versatile 3.3/2.5/1.8-V CMOS I/O driver
built in a 0.2-µm, 3.5-nm Tox, 1.8-V CMOS technology,” IEEE J. Solid-State Circuits , vol. 34, pp. 1501-1511, Nov. 1999.
[3] Y. Kanno, et al., “Level converters with high immunity to
power-supply bouncing for high-speed sub-1-V LSIs,” in Proc.of Symp. on VLSI Circuits , June 2000, pp. 202-203.
[4] E. Seevinck, et al., “Static-noi margin analysis of MOS
SRAM cells,” IEEE J. Solid-State Circuits , vol. 22, pp. 748-754,Oct. 1987.
[5] K.-K. Young, et al ., “A 0.13µm CMOS technology with 193nm
lithography and Cu/low-k for high performance applications,”in Tech. Dig. of IEDM , Dec., 2000.
F IGURE 11. S IMULATED W AVEFORMS OF L EVEL -D OWN S HIFTER .

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