LASER CHARACTERIZATION SYSTEM AND PROCESS

更新时间:2023-07-28 07:48:43 阅读: 评论:0

专利名称:LASER CHARACTERIZATION SYSTEM AND
PROCESS
发明人:Yin Wang,Gerard P. Wysocki,Feng Xie,Chung-
电脑时间怎么自动校准
En Zah
申请号:US13303648
医护员手术室互殴>天亮了背后的故事申请日:20111123
腹背受敌什么意思公开号:US20120268743A1
中国职位公开日:
组织效率
我国最大的半岛
20121025
专利内容由知识产权出版社提供
普通话二级甲等多少分专利附图:
摘要:A system and process for automatically characterizing a plurality of external cavity miconductor lar chips on a miconductor lar bar parated from a
miconductor wafer. The system includes a diffraction grating and a steering mirror mounted on a rotary stage for rotating the diffraction grating through a range of diffraction angles. A lar bar positioning stage for automatically aligning each lar chip in a lar bar with the diffraction grating. Reflecting a lar beam emitted from a lar chip in a lar bar with diffraction grating and steering mirror to the lar analyzer. Automatically rotating the diffraction grating through a range of diffraction angles relative to the lar beam and automatically characterizing the lar optical properties such as spectra, power, or spatial modes with the lar analyzer at each diffraction angle.
申请人:Yin Wang,Gerard P. Wysocki,Feng Xie,Chung-En Zah
地址:Princeton NJ US,Princeton NJ US,Painted Post NY US,Holmdel NJ US
国籍:US,US,US,US
更多信息请下载全文后查看

本文发布于:2023-07-28 07:48:43,感谢您对本站的认可!

本文链接:https://www.wtabcd.cn/fanwen/fan/82/1121441.html

版权声明:本站内容均来自互联网,仅供演示用,请勿用于商业和其他非法用途。如果侵犯了您的权益请与我们联系,我们将在24小时内删除。

标签:专利   知识产权   出版社   内容   全文
相关文章
留言与评论(共有 0 条评论)
   
验证码:
推荐文章
排行榜
Copyright ©2019-2022 Comsenz Inc.Powered by © 专利检索| 网站地图