专利名称:LASER CHARACTERIZATION SYSTEM AND
PROCESS
发明人:Yin Wang,Gerard P. Wysocki,Feng Xie,Chung-
电脑时间怎么自动校准
En Zah
申请号:US13303648
医护员手术室互殴>天亮了背后的故事申请日:20111123
腹背受敌什么意思公开号:US20120268743A1
中国职位公开日:
组织效率
我国最大的半岛
20121025
专利内容由知识产权出版社提供
普通话二级甲等多少分专利附图:
摘要:A system and process for automatically characterizing a plurality of external cavity miconductor lar chips on a miconductor lar bar parated from a
miconductor wafer. The system includes a diffraction grating and a steering mirror mounted on a rotary stage for rotating the diffraction grating through a range of diffraction angles. A lar bar positioning stage for automatically aligning each lar chip in a lar bar with the diffraction grating. Reflecting a lar beam emitted from a lar chip in a lar bar with diffraction grating and steering mirror to the lar analyzer. Automatically rotating the diffraction grating through a range of diffraction angles relative to the lar beam and automatically characterizing the lar optical properties such as spectra, power, or spatial modes with the lar analyzer at each diffraction angle.
申请人:Yin Wang,Gerard P. Wysocki,Feng Xie,Chung-En Zah
地址:Princeton NJ US,Princeton NJ US,Painted Post NY US,Holmdel NJ US
国籍:US,US,US,US
更多信息请下载全文后查看