专利名称：Photomask blank, photomask and
羊肉大葱饺子fabrication method thereof循规蹈矩的反义词
发明人：Yoshikawa, Hiroki, c/o Shin-Etsu Chemical
Co., Ltd,Inazuki, Yukio, c/o Shin-Etsu
Chemical Co., Ltd,Kina, Yoshinori, c/o Shin-
Etsu Chemical Co., Ltd,Okazaki, Satoshi, c/o
Shin-Etsu Chemical Co., Ltd,Haraguchi,
Takashi,Iwakata, Masahide,Fukushima, Yuichi
申请号：EP05022691.9
申请日：20051018
公开号：EP1650600A3
公开日：
20060531
专利内容由知识产权出版社提供
专利附图：
努力励志的句子
摘要：A light-shieldable film (12) is formed on one principal plane of an optically transparent substrate (11), and the light-shieldable film (12) has a first light-shieldable film (13) and a cond light-shieldable film (14) overlying the first light-shieldable film
(13). The first light-shieldable film (13) is a film that is not substantially etched by fluorine-bad (F-bad) dry etching and is primarily compod of chromium oxide,
农村医学chromium nitride, chromium oxynitride or the like. The cond light-shieldable film (14) is a film that is primarily compod of a silicon-containing compound that can be etched by F-bad dry etching, such as silicon oxide, silicon nitride, silicon oxynitride,
独立主机silicon/transition-metal oxide, silicon/transition-metal nitride or silicon/transition-metal oxynitride.
申请人：Shin-Etsu Chemical Co., Ltd.,Toppan Printing Co., Ltd.
地址：6-1 Ohtemachi 2-chome Tokyo 100-0005 JP,1-5-1 Taito Taito-ku Tokyo 110-8560 JP
暗恋表白
国籍：JP,JP尖利的东西
代理机构：Altenburg, Udo
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