专利名称：VERTICAL INLINE CVD SYSTEM
发明人：MORI, Ikuo,KURITA, Shinichi,KUDELA,
Jozef,ANWAR, Suhail,WHITE, John M.,YIM,
Dong-Kil,WOLF, Hans,ZVALO,
Dennis,INAGAWA, Makoto
申请号：US2011/034619
申请日：20110429
公开号：WO2011/137371A3
公开日：
玩组词
20120301
专利内容由知识产权出版社提供
专利附图：
一夜乡心五处同
win10屏保摘要：The prent invention generally relates to a vertical CVD system having a红楼梦的主要内容
从当下出发
processing chamber that is capable of processing multiple substrates. The multiple substrates are dispod on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be procesd simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are ud to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.
申请人：APPLIED MATERIALS, INC.,MORI, Ikuo,KURITA, Shinichi,KUDELA, Jozef,ANWAR, Suhail,WHITE, John M.,YIM, Dong-Kil,WOLF, Hans,ZVALO, Dennis,INAGAWA, Makoto 地址：3050 Bowers Avenue Santa Clara, California 95054 US,6923 Burnside Drive San Jo, California 95120 US,1151 Cordelia Avenue San Jo, California 95129 US,1261 Lakeside Drive, # 2201 Sunnyvale, California 94085 US,539 Villa Centre Way San Jo, California 95128 US,2811 Colony View Place H
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ayward, California 94541 US,# 403-502, Shinsung Apt. Puruen-Maeul, Soonae-dong Bundang-Ku, Sungnam Kyunggi-do 463-779 KR,Muehlstr. 15 63526 Erlene DE,726 Raney Court Santa Clara, California 95050 US,738 Matadero Avenue Palo Alto, California 94306 US
词的定义国籍：US,US,US,US,US,US,KR,DE,US,US
代理人：PATTERSON, B. Todd et al.
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