醋洗脸有什么好处>心灵之约专利名称：Method of patterning a substrate by feeding mask defect data forward for
subquent correction
发明人：Jed H. Rankin,Andrew J. Watts
物业管理思路及方案申请号：US11275178
申请日：20051216
公开号：US07211356B2
增长率问题
电脑辐射对孕妇有影响吗公开日：
拾起20070501
河南十大名校专利内容由知识产权出版社提供
摘要：A method is provided for patterning a substrate. In such method a first mask, for example, a front-end-of-line (“FEOL”) mask is fabricated, the first mask including a plurality of first features such as FEOL features which are usable to pattern regular elements and redundancy elements of a substrate such as a microelectronic substrate and/or a micro-electromechanical substrate. The first mask is tested, i.e., inspected for defects in the features. Thereafter, a cond quentially ud mask, for example, a back-end-of-line (“BEOL”) mask is fabricated which includes a plurality of cond features, e.g., BEOL features, such features being usable to pattern a plurality of interconnections between individual ones of the regular elements and between the regular elements and the redundancy elements. The regular elements and the redundancy elements are patterned using the first mask and the interconnections between them are patterned using the cond mask. As a result, the interconnections are patterned in a way that corrects for the detected defects in the first mask.
申请人：Jed H. Rankin,Andrew J. Watts
地址：South Burlington VT US,Esx Junction VT US
国籍：US,US花蛤干的做法大全
代理人：Richard M. Kotulak 更多信息请下载全文后查看
