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Nederland © 2023028
锄禾日当午汗滴禾下土(2?) Aanvraagnummer: 2023028© Aanvraag ingediend: 30 april 2019
描写大熊猫的作文
© A OCTROOIAANVRAAG
© Int. Cl.:
G03F 7/20 (2019.01)
54) Method for Providing a Wear-Resistant Material on a Body, and Composite Body © Aanvraag ingeschreven:
© Aanvrager(s):15 mei 2019
ASML Netherlands B.V. te Veldhoven.0 Aanvraag gepubliceerd:
15 mei 2019© Uitvinder(s):
Andrey Nikipelov te Veldhoven.
Antonius Franciscus Johannes de Groot
错题分析te Veldhoven.
王尔德名言© Gemachtigde:
ir. A.J. Maas te Veldhoven.
© There is disclod a method for providing a wear-resistant material on a body. There is also disclod a composite
body that may be obtained by the method. The composite body may be a substrate holder or a reticle clamp for u in a lithographic apparatus. The method compris providing a body made of glass, ceramic or glass-ceramic; providing a wear-resistant material having a hardness of more than 20 GPa; and brazing or lar welding the wear-resistant material to the body.
N L A 2023028Deze publicatie komt overeen met de oorspronkelijk ingediende stukken.关于人的诗句
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Method for Providing a Wear-Resistant Material on a Body,and Composite Body
采矿工FIELD
[0001]The prent invention relates to a method for providing a wear-resistant material on a body, such as an unfinished substrate holder or an unfinished reticle clamp.The prent invention also relates to a composite body,such as a substrate holder or a reticle clamp,comprising a wear-resistant material.
BACKGROUND
[0002]A lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
A lithographic apparatus can be ud,for example,in the manufacture of integrated circuits(ICs).A lithographic apparatus may,for example,project a pattern(also often referred to as“design layout”or “design”)of a patterning ,a mask)onto a layer of radiation-nsitive material(resist) provided on a ,a wafer).
[0003]The substrate is clamped onto a substrate holder in the lithographic apparatus when transferring a pattern from the patterning device.The substrate holder conventionally has a plurality of burls to support the substrate.The total area of the burls that contact the substrate is small compared to the total area of the substrate.Therefore,the chance that a contaminant particle randomly located on the surface of the substrate or the substrate holder is trapped between a burl and the substrate is small.Also,in manufacture of the substrate holder,the tops of the burls can be made more accurately coplanar than a large surface can be made accurately flat.
[0004]When a substrate is first loaded onto the substrate holder in preparation for exposure,the substrate is supported by so-called e-pins which hold the substrate at three positions.While the substrate is being held by the e-pins,its own weight will cau the substrate to becoming convex when viewed from above.To load the substrate onto the substrate holder,the e-pins are retracted so that the substrate is supported by burls of the substrate holder.As the substrate is lowered onto the burls of the substrate holder,the substrate will contact in some ar the edge, before other ar the center.Any friction between the burls and the lower surface of the substrate may prevent the substrate from fully relaxing into a flat unstresd state.This can lead to focus and overlay errors during exposure of the substrate.
继续教育培训总结
[0005]The substrate holder is commonly made of a ceramic material such as silicon carbide(SiC) or SiSiC,a material having SiC grains in a silicon matrix.Such a ceramic material can readily be machined to a desired shape using conventional manufacturing methods.When substrates are loaded and unloaded from the substrate holder,the ceramic material can wear quickly.The comparably high frictional coefficient of the ceramic material may also prevent the substrate from relaxing into a flat unstresd state when loaded onto the substrate holder.
