专利名称：SAMPLE POLISHING METHOD AND SAMPLE
蹦组词被坚执锐POLISHING DEVICE欺凌近义词
发明人：WATABE KYOJI，渡部 橋司,HORII KENICHI，堀井
謙一
申请号：JP特願平11-155736
申请日：19990602
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公开号：JP特開2000-343406(P2000-343406A)A
公开日：
20001212
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专利内容由知识产权出版社提供
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专利附图：
长大之后>一样高的英文摘要：PROBLEM TO BE SOLVED: To shorten dressing time when exchanging polishing pads and to stabilize ordinary dressing done for a polishing pad during u to restore a
polishing rate. SOLUTION: As a dressing head dressing by pressing a dress face of a polishing pad 3 against a surface of the polishing pad 3 fixed on a polishing surface plate 2, a first dressing head 51 having a relatively fine dress face and suppressing a dressing amount and a cond dressing head 52 having a relatively coar dress face and increasing a dressing amount are provided. They are ud independently in accordance with a condition of the polishing pad 3 to be polished or are ud by combining them appropriately.
申请人：SUMITOMO METAL IND LTD，住友金属工業株式会社
地址：大阪府大阪市中央区北浜4丁目5番33号
国籍：JP
代理人：河野 登夫
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