专利名称：Production manner null of the part due to 发明人：後藤 友彰，松下 浩二
申请号：JP特願平7-11308
青春回忆录申请日：19950127
热力循环公开号：JP特許第3309620号(P3309620)B2
公开日：
20020729
专利内容由知识产权出版社提供
教务工作摘要：PURPOSE: To micromachine the etching part of a silicon substrate vertically into an intricate shape where the corner of the bottom is slightly rounded. CONSTITUTION: A substrate 1 of single crystal silicon is applied, at a part not to be micromachined, with a mask 2 of aluminum film. The unmasked part is then etched by generating plasma of mixture gas of hexafluorosulfur and oxygen. The etched part is also applied with masks 3, 4 before being etched furthermore.
仓山万达店申请人：富士電機株式会社
地址：神奈川県川崎市川崎区田辺新田1番1号
徐右冰
犹太人的故事国籍：JP
电脑突然很卡代理人：篠部 正治
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